Internal Stress Control for Thin Film Actuator
R. Toyoda, S. Toya, S. Miyata, M. Hashimoto, T. Iijima, A. Tonegawa and Y. Matsumura
Tokai University, Hiratsuka-shi, Japan
The fine tuning of the internal stress is one of the important requirements for tailored thin film actuators. In this study, the internal stress control of thin film actuator with an ion bombardment parameter Pi is discussed. Plasma diagnostics in sputter deposition were carried out with combined measurement system of a single Langmuir probe and an ion energy analyzer. The internal stress of thin films was increased with the increasing of ion bombardment parameter Pi. These results suggest that the possibility of the designing of internal stress for thin film actuator with the ion bombardment parameter Pi.
ACTUATOR 2014 Manuscript Poster 30
Publication date: 10/04/2015
Manuscript Poster 30 published in Conference Proceedings ACTUATOR 2014
El vendedor asume toda la responsabilidad de esta entrada.