Internal Stress Effects on Magnetostrictive Properties of Sputtered Giant Magnetostrictive Thin
S. Sakano, R. Toyoda, A.A.Y Mansi, T. Washihira, Y. Matsumura
Tokai University, Hiratsuka-shi, Japan
Internal stress of the Sm-Fe thin films was investigated considering ion bombardment. The Sm-Fe thin films were deposited by DC magnetron sputtering process with various substrate bias voltage. The effect of ion bombardment on internal stress of Sm-Fe thin films was estimated by the ion bombardment parameter Pi. The ion bombardment parameter Pi increased with increasing negative substrate voltage. Internal stress of Sm-Fe thin films showed a larger compressive stress with increasing amount of the ion bombardment parameter Pi. The magnetostrictive susceptibility of Sm-Fe thin films was improved by increasing compressive stress. The magnetostrictive susceptibility of the Sm-Fe thin film was dependent on the Pi.
ACTUATOR 2016 Manuscript P 53
Publication date: 01/06/2016
Manuscript P 53 published in Conference Proceedings ACTUATOR 2016
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